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Semiconductor fabrication facilities and comparable research and development areas in which hazardous production materials (HPM) are used and the aggregate quantity of materials is in excess of those specified in Table 307.1(1) and [F] Table 307.1(2) shall be classified as Group H-5. Such facilities and areas shall be designed and constructed in accordance with Section 415.11.

Related Code Sections

307.7 Occupancy Classification and Use, High-Hazard Group H-5
and the aggregate quantity of materials is in excess of those specified in Table 307.1(1) and [F] Table 307.1(2) shall be classified as Group H-5. Such ...
307.7 Occupancy Classification and Use, High-Hazard Group H-5
and the aggregate quantity of materials is in excess of those listed in Tables 307.1(1) and 307.1(2) shall be classified as Group H-5. Such facilities and areas ...
302.1 Occupancy Classification and Use, Occupancy Classification
Section 306): Groups F-1 and F-2. High Hazard (see Section 307): Groups H-1, H-2, H-3, H-4 and H-5. Institutional (see Section 308): Groups I-1, I-2, I ...
302.1 Occupancy Classification and Use, Occupancy Classification
Section 306): Groups F-1 and F-2. High Hazard (see Section 307): Groups H-1, H-2, H-3, H-4 and H-5. Institutional (see Section 308): Groups I-1, I-2, I ...
903.2.5 Fire Protection and Life Safety Systems, Group H
throughout buildings containing Group H-5 occupancies. The design of the sprinkler system shall be not less than that required by this code ...